Fermi level

The energy at which the probability of electron occupation is 1/2 in thermal equilibrium. The reference energy that determines carrier concentrations, junction band-bending, and contact alignment in all semiconductor devices.

Optics fundamentalsUpdated October 2026

The Fermi level EF is the energy at which the Fermi-Dirac distribution function equals 1/2, the energy at which an electronic state has 50% probability of being occupied at thermal equilibrium. It is the central concept of semiconductor statistics and determines carrier concentrations, band alignment at junctions, and the thermal equilibrium behavior of all electronic devices.

Defining property. From the Fermi-Dirac distribution:

f(E)=11+exp⁡[(E−EF)/kBT],f(EF)=1/2.

States below EF are mostly occupied; states above are mostly empty. The transition width is ∼kBT=25.9 meV at 300 K.

Equilibrium carrier concentrations. Combining the Fermi-Dirac distribution with the density of states:

n=∫Ec∞gc(E)f(E) dE,p=∫−∞Evgv(E)[1−f(E)] dE.

In the non-degenerate limit (Fermi level well within bandgap, several kBT from band edges):

n=Ncexp⁡[−(Ec−EF)/kBT],p=Nvexp⁡[−(EF−Ev)/kBT].

These are the standard formulas; together with np=ni2 (mass-action law), they determine equilibrium carrier statistics.

Intrinsic Fermi level. For an intrinsic (undoped) semiconductor, the Fermi level lies near mid-gap:

EFintrinsic  =  Ec+Ev2+kBT2ln⁡(Nv/Nc).

The slight offset from exact mid-gap depends on the asymmetry of conduction- and valence-band DOS. For GaAs (Nv/Nc=15): EFintrinsic is shifted ∼35 meV above mid-gap toward the conduction band.

Doping-controlled Fermi level.

DopingEF position
IntrinsicMid-gap (approximately)
Light n-type (ND=1015 cm⁻³ Si)Ec−0.26 eV
Moderate n-type (ND=1017 cm⁻³ Si)Ec−0.15 eV
Heavy n-type (ND=1019 cm⁻³ Si)Ec−0.02 eV (near degeneracy)
Light p-type (NA=1015 cm⁻³ Si)Ev+0.24 eV
Heavy p-type (NA=1019 cm⁻³ Si)Ev−0.01 eV (degenerate)

For degenerate doping (ND>Nc or NA>Nv), the Fermi level enters the conduction band (n-type) or valence band (p-type) and the Boltzmann approximations no longer apply.

Fermi level and chemical potential. The Fermi level is the electrochemical potential of electrons. In a system without external fields, electrons flow from high EF to low EF until EF is uniform. This is the condition of thermal equilibrium. At equilibrium, EF is constant throughout the device:

  • In a p-n junction at equilibrium: EF is flat; the band edges Ec and Ev bend to maintain the uniform EF as doping changes
  • In a heterojunction at equilibrium: EF is flat; the band offsets ΔEc and ΔEv appear as abrupt steps in Ec and Ev at the interface, on top of the band bending in the depletion regions

Quasi-Fermi levels under bias. When a semiconductor is driven away from thermal equilibrium (forward bias, optical excitation), the single EF splits into separate "quasi-Fermi levels" for electrons (EFn) and holes (EFp). Their splitting characterizes the degree of non-equilibrium and determines optical gain:

Δμ  =  EFn−EFp  ≥  hνphoton.

This Bernard-Duraffourg condition is the formal requirement for net optical gain.

Fermi level in contacts.

Contact typeFermi level behavior
Ohmic contactEF aligns smoothly with semiconductor EF; minimal barrier
Schottky contactEF pinned at metal-induced gap states; large barrier possible
Heavily-doped tunneling contactEF above conduction band; tunneling barrier
Insulating contact (MOS, capacitor)EF separated by insulator; no current flow

Fermi-level pinning at metal-semiconductor interfaces is a major design challenge for low-resistance contacts. Methods to mitigate:

  • Heavy doping at the contact (improve tunneling)
  • Selecting metals with appropriate work functions
  • Inserting transitional barrier layers
  • Compositional grading

Work function. The work function of a semiconductor is the energy difference between the Fermi level and the vacuum level:

Φ  =  χ+(Ec−EF),

where χ is the electron affinity (vacuum to Ec). Work function is critical for:

  • Predicting Schottky barrier heights (ΦBn=ΦM−χ Schottky-Mott formula)
  • Designing heterojunction band alignment
  • Selecting contact metals
  • Photoemission spectroscopy interpretation

Hot-carrier Fermi level. Under strong injection or optical excitation, the carrier distribution can be non-thermal, characterized by an effective temperature Tc>Tlattice. The quasi-Fermi-level concept still applies but with the elevated carrier temperature.

Fermi level in 2D materials. For 2D materials (graphene, MoS₂, etc.) and 2DEGs (modulation-doped heterostructures), the Fermi level is referenced to the 2D band structure:

  • Graphene: EF can be tuned through the Dirac point; carrier density varies dramatically with EF position
  • 2DEG in GaAs/AlGaAs heterostructure: EF in the 2DEG plane is set by the donor depletion in the supply layer

Why Fermi level matters for photonics.

  • Laser threshold: requires a quasi-Fermi-level separation greater than the photon energy hν at the lasing wavelength, itself at least Eg
  • Photodetector response: junction Fermi-level offset sets dark current and photocurrent
  • Modulator efficiency: index/absorption changes track quasi-Fermi-level separation
  • Solar cell efficiency: Voc=ΔEF/q where ΔEF is the quasi-Fermi-level splitting under illumination
  • Carrier injection efficiency: alignment of metal Fermi level with semiconductor band edge determines contact resistance

Temperature dependence. The intrinsic Fermi level changes weakly with T (through the Tln⁡(Nv/Nc) term). For doped semiconductors at moderate doping, the Fermi level changes more strongly:

  • Ionization of dopants: EF moves away from the dopant level toward mid-gap as the dopants ionize with rising T
  • Carrier statistics: EF shifts toward mid-gap as T increases ("intrinsic limit")
  • Freezeout: at low T, dopants un-ionize and EF moves toward dopant level

References: Saleh & Teich, Fundamentals of Photonics (3rd ed., 2019), Ch. 16; Sze & Ng, Physics of Semiconductor Devices (3rd ed., 2007), Ch. 1 (canonical Fermi-level treatment); Pierret, Semiconductor Device Fundamentals (1996) for the comprehensive carrier-statistics derivation.

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